Corner-lock stitch patterns

ABSTRACT

Stitching patterns overlap to produce a corner-locked stitch pattern. The corner-locked stitch pattern includes one or more thread interlace points, and one or more overlays of threads from overlapping patterns. A network of corner-lock stitch patterns produces a mesh, which may be embroidered into a substrate, such as a medical textile or biotextile. Corner-lock stitch patterns resist puncture-induced and tension-induced deformation of mesh pores between corner-locked stitch patterns, and may be used to modulate compliance and enhance strength properties of a substrate into which they are sewn.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.15/196,439 filed on Jun. 29, 2016, and claims priority to U.S.Provisional Patent Application No. 62/186,437 filed on Jun. 30, 2015,the contents of each application are incorporated by reference herein,in their entirety and for all purposes.

FIELD

The disclosure relates generally to the field of sewing. Moreparticularly, the disclosure relates to corner-lock stitches made byoverlaying threads of separately laid stitch patterns, with the overlaysbeing supported by thread interlace points near to the overlay points.The disclosure further relates to methods for producing thesecorner-lock stitches, meshes formed from a plurality of interwovencorner-lock stitches, and substrate materials, including substratemeshes, comprising corner-lock stitch patterns. The corner-lock stitchesresist deformation, stretching, and pulling apart of the stitchpatterns. The corner-lock stitches can be used to modulate thecompliance of a substrate, and can also be used to enhance the strengthof a substrate.

BACKGROUND

Various publications, including patents, published applications,technical articles and scholarly articles are cited throughout thespecification. Each of these cited publications is incorporated byreference herein, in its entirety and for all purposes.

Sewing is an ancient art, primarily used to join pieces of fabric orlike materials together. Sewing may also be used to add designs onto(e.g., embroidery), or reinforce or add strength or rigidity to fabricsor like materials. Yarns or threads bridge pieces of materials togetheror form the design or reinforcing backbone in the materials.

Yarns or threads are placed via stitching, and stitching may be done byhand or by a machine. Various stitching techniques and patterns areavailable, depending on the particular application or the type ofmaterial.

The advent of the sewing machine introduced the lockstitch (FIG. 1A),whereby two separate threads (or yarns), an upper thread and lowerthread, become intertwined by the coordination of the sewing needle,which delivers the upper thread into the material being sewn, and asecondary mechanism, typically a bobbin and bobbin driver, whichprovides the lower thread. The coordinated movement of the sewing needleand bobbin driver intertwines the upper and lower threads, which isknown as a lockstitch, in the material being sewn.

Nearly any material that can be punctured with a sewing needle may besewn. The materials may be woven, knitted, or non-woven. Historically,such materials included fabrics and textiles. In more recent times,materials have been expanded to include polymeric fabrics, as well asbiotextiles and medical textiles. Biotextiles include implantablematerials, including extracellular matrix scaffolds, prosthetic heartvalves, synthetic skin, and other materials that include living tissueor materials derived from living tissue.

In some biotextiles, a reinforcing mesh may be sewn into the material.Medical practitioners have raised concerns, however, that in the eventthe biologic substrate material of the biotextiles is destroyed by thebody, or resorbs too quickly (i.e., before the body self-repairs theinjury for which the biotextile has been implanted), the widevoids/pores/interstices between stitch patterns in the extantreinforcing mesh may stretch open (FIG. 2), and allow body tissue toherniate through the stretched mesh cells, causing a potential seriouscondition in the patient. Accordingly, there is a need in the art to beable to prevent stretching and deformation of the pores of a sewn mesh,particularly for biotextiles.

SUMMARY

The disclosure features corner-lock stitch patterns, substratescomprising corner-lock stitch patterns, and methods for producingcorner-lock stitch patterns or substrates comprising corner-lock stitchpatterns. In some aspects, a corner-lock stitch pattern comprises afirst pattern of a first upper thread and a first lower threadcomprising one or more curves, one or more angles, or a combination ofone or more curves and one or more angles, and a second pattern of asecond upper thread and a second lower thread comprising one or morecurves, one or more angles, or a combination of one or more curves andone or more angles. Yarn may be used in place of thread in the firstpattern, second pattern, or both. At least one of the one or more curvesor the one or more angles of the second pattern overlap at least one ofthe one or more curves or the one or more angles of the first pattern.One or more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points and two or more threadoverlays in which the second upper thread and second lower threadenvelope the first upper thread and first lower thread. In preferredaspects, one or more of the overlaps comprises a corner-lock stitchpattern comprising two thread interlace points and two thread overlaysin which the second upper thread and second lower thread envelope thefirst upper thread and first lower thread.

In some aspects, the first pattern and the second pattern each compriseone or more angles, and one or more of the overlaps comprises acorner-lock stitch pattern comprising one or more thread interlacepoints proximal to the vertex of each angle. In some aspects, the firstpattern and the second pattern each comprise one or more angles, and oneor more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points in close proximity to thevertex of each angle. In some aspects, the first pattern and the secondpattern each comprise one or more angles, and one or more of theoverlaps comprises a corner-lock stitch pattern comprising one or morethread interlace points substantially at the vertex of each angle. Inany such case, the two or more thread overlays may be proximal to thevertex, or may be in close proximity to the vertex, or may besubstantially at the vertex.

The first pattern may comprises a plurality of angles forming one ormore polygonal rings. The second pattern may comprise a plurality ofangles forming one or more polygonal rings. At least one ring of thesecond pattern may overlap at least one ring of the first pattern, andeach overlapping ring preferably comprises a corner-lock stitch pattern.The corner-lock stitch pattern may comprise one or more thread interlacepoints, which thread interlace points may be proximal to the vertex ofoverlapped angles from each overlapped ring, or may be in closeproximity to the vertex of overlapped angles from each overlapped ring,or may be substantially at the vertex of overlapped angles from eachoverlapped ring. In any such case, the two or more thread overlays maybe proximal to the vertex, or may be in close proximity to the vertex,or may be substantially at the vertex. The one or more polygonal ringsmay comprise substantially an irregular shape, or a diamond, square,rhomboid, rectangular, or parallelogram shape, or any combinationthereof.

In some aspects, the first pattern and the second pattern each compriseone or more curves, and one or more of the overlaps comprises acorner-lock stitch pattern comprising one or more thread interlacepoints proximal to the vertex of each curve. In some aspects, the firstpattern and the second pattern each comprise one or more curves, and oneor more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points in close proximity to thevertex of each curve. In some aspects, the first pattern and the secondpattern each comprise one or more curves, and one or more of theoverlaps comprises a corner-lock stitch pattern comprising one or morethread interlace points substantially at the vertex of each curve. Inany such case, the two or more thread overlays may be proximal to thevertex, or may be in close proximity to the vertex, or may besubstantially at the vertex.

The first pattern may comprise a plurality of curves forming one or morecircular rings. The second pattern may comprise a plurality of curvesforming one or more circular rings. At least one ring of the secondpattern may overlap at least one ring of the first pattern, and eachoverlapping ring preferably comprises a corner-lock stitch pattern. Thecorner-lock stitch pattern may comprise a thread interlace point, whichthread interlace point may be proximal to the vertex of the overlappedcurve of each ring, or may be in close proximity to proximal to thevertex of the overlapped curve of each ring, or may be substantially atthe vertex of the overlapped curve of each ring. In any such case, thetwo or more thread overlays may be proximal to the vertex, or may be inclose proximity to the vertex, or may be substantially at the vertex.

Meshes comprising one or more corner-lock stitch patterns are provided.A plurality of corner-lock stitches together form a mesh.

Substrate materials comprising one or more corner-lock stitch patternsare provided. A corner-lock stitch pattern, or mesh thereof, is sewn orembroidered into or onto a substrate. The substrate itself may be amesh. In some aspects, a substrate comprising a corner-lock stitchpattern sewn or embroidered onto or into the substrate comprises ahernia repair material. The substrate may comprise a polymer. Thesubstrate may comprise a medical textile. The substrate may comprise abiotextile. The thread or yarn used to sew or embroider the corner-lockstitch pattern may comprise a polymer.

In a mesh comprising a plurality of corner-lock stitch patterns, thepores of the mesh, as bound by a plurality of corner-lock stitches, mayhave a substantially diamond shape, a square shape, a parallelogramshape, a rhomboid shape, or a combination thereof. The pores of the meshmay have substantially a hexagonal shape. The pores of the mesh may havea substantially octagonal shape. The pores of the mesh may have asubstantially circular shape. The pores may be arranged in one or morerows, in any directional orientation. The pores may overlap other pores.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whereinthe first pattern comprises one or more curves, one or more angles, or acombination of one or more curves and one or more angles, then sewing asecond upper thread and a second lower thread in a second pattern intothe substrate material, wherein the second pattern comprises one or morecurves, one or more angles, or a combination of one or more curves andone or more angles. Based on such pattern sewing, at least one of theone or more curves or the one or more angles of the second patternoverlaps at least one of the one or more curves or the one or moreangles of the first pattern, and each overlap comprises a corner-lockstitch pattern comprising at least one thread interlace pointsubstantially at the vertex of each curve, angle, or curve and angle,and two thread overlays proximal to each vertex. Each thread overlaycomprises the second upper thread and second lower thread enveloping thefirst upper thread and first lower thread.

In some aspects of the methods, the first pattern and the second patterneach comprise one or more angles, and one or more of the overlapscomprises a corner-lock stitch pattern comprising one or more threadinterlace points proximal to the vertex of each angle. In some aspects,the first pattern and the second pattern each comprise one or moreangles, and one or more of the overlaps comprises a corner-lock stitchpattern comprising one or more thread interlace points in closeproximity to the vertex of each angle. In some aspects, the firstpattern and the second pattern each comprise one or more angles, and oneor more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points substantially at thevertex of each angle. In any such case, the two or more thread overlaysmay be proximal to the vertex, or may be in close proximity to thevertex, or may be substantially at the vertex.

The first pattern may comprises a plurality of angles forming one ormore polygonal rings. The second pattern may comprise a plurality ofangles forming one or more polygonal rings. At least one ring of thesecond pattern may overlap at least one ring of the first pattern, andeach overlapping ring preferably comprises a corner-lock stitch pattern.The corner-lock stitch pattern may comprise one or more thread interlacepoints, which thread interlace points may be proximal to the vertex ofoverlapped angles from each overlapped ring, or may be in closeproximity to the vertex of overlapped angles from each overlapped ring,or may be substantially at the vertex of overlapped angles from eachoverlapped ring. In any such case, the two or more thread overlays maybe proximal to the vertex, or may be in close proximity to the vertex,or may be substantially at the vertex. The one or more polygonal ringsmay comprise substantially an irregular shape, or a diamond, square,rhomboid, rectangular, or parallelogram shape, or any combinationthereof.

In some aspects of the methods, the first pattern and the second patterneach comprise one or more curves, and one or more of the overlapscomprises a corner-lock stitch pattern comprising one or more threadinterlace points proximal to the vertex of each curve. In some aspects,the first pattern and the second pattern each comprise one or morecurves, and one or more of the overlaps comprises a corner-lock stitchpattern comprising one or more thread interlace points in closeproximity to the vertex of each curve. In some aspects, the firstpattern and the second pattern each comprise one or more curves, and oneor more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points substantially at thevertex of each curve. In any such case, the two or more thread overlaysmay be proximal to the vertex, or may be in close proximity to thevertex, or may be substantially at the vertex.

The first pattern may comprise a plurality of curves forming one or morecircular rings. The second pattern may comprise a plurality of curvesforming one or more circular rings. At least one ring of the secondpattern may overlap at least one ring of the first pattern, and eachoverlapping ring preferably comprises a corner-lock stitch pattern. Thecorner-lock stitch pattern may comprise a thread interlace point, whichthread interlace point may be proximal to the vertex of the overlappedcurve of each ring, or may be in close proximity to proximal to thevertex of the overlapped curve of each ring, or may be substantially atthe vertex of the overlapped curve of each ring. In any such case, thetwo or more thread overlays may be proximal to the vertex, or may be inclose proximity to the vertex, or may be substantially at the vertex.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whereinthe first pattern comprises one or more curves, one or more angles, or acombination of one or more curves and one or more angles, then sewing asecond upper thread and a second lower thread in a second pattern intothe substrate material, wherein the second pattern comprises one or morecurves, one or more angles, or a combination of one or more curves andone or more angles. Based on such pattern sewing, at least one of theone or more curves or the one or more angles of the second patternoverlaps at least one of the one or more curves or the one or moreangles of the first pattern, and each overlap comprises a corner-lockstitch pattern comprising one or more thread interlace points and two ormore thread overlays. Each thread overlay comprises the second upperthread and second lower thread enveloping the first upper thread andfirst lower thread. In some aspects, the first pattern comprises aplurality of angles forming one or more polygonal rings, and the secondpattern comprises a plurality of angles forming one or more polygonalrings. In such patterns, at least one ring of the second patternoverlaps at least one ring of the first pattern, and at least one of theoverlapping rings comprises a corner-lock stitch pattern comprising morethan one thread interlace point.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whereinthe first pattern comprises one or more straight lines, then sewing asecond upper thread and a second lower thread in a second pattern intothe substrate material, wherein the second pattern comprises a pluralityof angles forming one or more polygonal rings. Based on such sewingpatterns, at least one ring of the second pattern overlaps at least oneof the straight lines of the first pattern and each overlap comprises acorner-lock stitch pattern comprising one or more thread interlacepoints and two or more thread overlays. Each thread overlay comprisesthe second upper thread and second lower thread enveloping the firstupper thread and first lower thread. In some aspects, at least one ofthe polygonal rings comprises a corner-lock stitch pattern comprisingmore than one thread interlace point.

Such methods may be used to form a mesh comprising one or morecorner-lock stitch patterns. Such methods may be used to impart one ormore corner-lock stitch patterns, including a mesh comprising suchpatterns, into a substrate. The substrate may comprise a polymer. Thesubstrate may comprise a medical textile. The substrate may comprise abiotextile. The thread or yarn used to sew or embroider the corner-lockstitch pattern may comprise a polymer. The mesh and/or substratematerial may be biocompatible, and may be resorbable. The mesh and/orsubstrate material may comprise a hernia repair implant.

BRIEF DESCRIPTION OF THE DRAWINGS

According to common practice, the various features of the drawings arenot to scale. On the contrary, the dimensions of the various featuresare arbitrarily expanded or reduced for clarity. Included in thedrawings are the following figures.

FIG. 1A shows an example of a typical lockstitch, having intertwinedupper and lower threads. A typical lockstitch as shown may be present ina thread interlace point within a sewing pattern. FIG. 1B shows anexample of a stitch pattern in which two straight stitches intersect.

FIG. 2 shows an image of a mesh formed by overlapping straight stitches,where there is no corner-lock at intersecting points. The lack of acorner-lock causes individual pores or clusters of pores within the meshto stretch and deform. Arrows show examples of such deformations,including widening, narrowing, and mis-shaping of the square/rectangularform originally produced by the overlapping of straight stitch patterns.

FIG. 3 shows an example of a corner-lock stitch pattern. Thiscorner-lock includes a thread interlace point from each thread pattern(shown in the expanded view (circle) as points A), and two threadoverlays (shown in the expanded view as points B). The corner-lockstitch pattern forms a mesh.

FIG. 4A shows an example of another corner-lock stitch pattern in whichstitching patterns include a plurality of angles, some of which areformed into polygonal rings (shown for illustration purposes only in adiamond shape). The polygonal rings of separate stitch patterns overlap,establishing the corner-lock within the area of overlap, with thecorner-lock including a thread interlace point from each thread patternand two thread overlays. The corner-lock stitch pattern forms a mesh.

FIG. 4B shows an example of another corner-lock stitch pattern in whichstitching patterns include a plurality of angles, some of which areformed into polygonal rings (shown for illustration purposes only in adiamond shape). The polygonal rings of separate stitch patterns overlap,establishing the corner-lock within the area of overlap, with thecorner-lock including a thread interlace point from each thread patternand two thread overlays. The corner-lock stitch pattern forms a mesh.

FIG. 4C shows an example of another corner-lock stitch pattern in whichstitching patterns include a plurality of curves, some of which areformed into circular rings. The rings of separate stitch patternsoverlap, establishing the corner-lock within the area of overlap, withthe corner-lock including a thread interlace point from each threadpattern and two thread overlays. The corner-lock stitch pattern forms amesh.

FIG. 5A shows an example of another corner-lock stitch pattern in whicha stitching pattern of polygonal shapes is overlapped with a straightstitch pattern, establishing the corner-lock within the area of overlap,with the corner-lock including three thread overlays. The corner-lockstitch pattern forms a mesh.

FIG. 5B shows an example of another corner-lock stitch pattern in whicha stitching pattern of triangular shapes is overlapped with a straightstitch pattern, establishing the corner-lock within the area of overlap,with the corner-lock including three thread overlays. The corner-lockstitch pattern forms a mesh.

FIG. 5C shows an example of another corner-lock stitch pattern in whicha curved stitched pattern is overlapped with a straight stitch pattern.

FIG. 6 shows an example of the mesh comprising corner-lock stitchesplaced under lateral tension (e.g., the mesh being pulled in thedirection of each arrow). The corner-locked pores do not substantiallydeform, and the diamond shape is substantially maintained under tension.

FIG. 7 shows a representation of a perspective of a corner-lock stitch,with the lighter grey line illustrating the first stitch pattern and thedarker grey line illustrating the second stitch pattern. The expandedview (circle) shows a representation of the configuration of the upperand lower threads at the vertex of the overlapping thread patternangles. As shown in the expanded view, the upper and lower thread of thesecond stitch pattern envelope the upper and lower thread of the firststitch pattern near the vertex. As the second stitch pattern is laid,the sewing needle punctures the substrate material adjacent to thevertex of the first stitch pattern, creating a thread interlace point,but the upper and lower threads of the second stitch pattern encirclethe upper and lower threads of the first stitch pattern in the process(a first overlay). As the sewing needle moves away to the next puncturepoint/interlace point in the material along the second stitch pattern,the upper and lower threads of the second stitch pattern again envelopethe upper and lower threads of the first stitch pattern (a secondoverlay). This, in turn, creates the corner lock stitch.

FIG. 8A shows an image of a mesh formed by a corner-locked stitchpattern, including corner-lock stitches at intersecting points. Betweenintersecting points, the threads are laid in a chain stitchconfiguration (the threads are looped), for illustration of variablestitching that may be used between corner locks.

FIG. 8B shows an image of a variation of the mesh shown in FIG. 8A. Inthis variation, a straight stitch is further laid horizontally acrosseach corner-lock.

FIG. 8C shows an image of another variation of the mesh shown in FIG.8A. In this variation, a second corner-locked stitch pattern is laid ontop of the first corner-locked stitch pattern. The second stitch patternis oriented diagonally relative to the first stitch pattern.

FIG. 9 shows an example of a mesh built upon a corner-lock stitchpattern. The mesh is shown in a liner X-Y plane. The pores are orientedin a parallelogram-like configuration, laid at about a 45 degree angle.

FIG. 10 shows another example of a mesh built upon a corner-lock stitchpattern. The mesh is shown in a liner X-Y plane. The pores are orientedin a parallelogram-like configuration, laid at about a 55 degree angle.

FIG. 11 shows another example of a mesh built upon a corner-lock stitchpattern. The mesh is shown in a liner X-Y plane. The pores are orientedin a hexagonal, honey-comb-like configuration, laid at about a 61 degreeangle.

FIG. 12 shows a representation of puncture forces on a sewn mesh. Inpart A, a cone (the triangle) is pointed down through the horizontalplane of the mesh (represented by the circle), with the pointed tip ofthe cone placed in contact with the mesh in an attempt to push the conethrough the mesh. Part B represents a non-corner-locked mesh produced byoverlapping straight stitches. In part B, the cone is easily pushed intothe mesh, causing the threads to spread apart and deform. Part Crepresents a corner-locked mesh according to this disclosure. In part C,the mesh resists puncture by the cone, and the threads do not spreadapart or deform.

FIG. 13 illustrates construction of a stitch pattern (corner-lockstitch, or comparative standard straight grid stitch) onto a substrate.As shown in a cut-away, half view, a substrate comprised of a center ofPVA and a perimeter of insoluble polymer is provided, and the desiredstitch pattern is sewn into each of the PVA and insoluble polymer. Oncethe stitch pattern is laid, the PVA center is dissolved away, leavingbehind a free mesh in the center.

FIG. 14 shows construction of a stitch pattern onto an EndoformReconstructive Template (ERT), a biotextile, substrate.

FIG. 15 illustrates how the ball burst test is carried out, with a mesh(with or without an underlying substrate) placed into a clamp, and thenwith a steel ball forced through the mesh.

FIG. 16 shows the results of a ball burst compliance test on apolyethylene mesh sewn as a corner-lock stitch pattern (dotted line) ora straight stitch pattern (solid line) into a four-layer ERT substrate.The chart shows force versus displacement.

FIG. 17 shows the results of a ball burst compliance test on apolypropylene mesh sewn as a corner-lock stitch pattern (dotted line) ora straight stitch pattern (solid line), without a substrate. The chartshows force versus displacement.

FIG. 18 shows the results of a ball burst compliance test on apolyethylene mesh sewn as a corner-lock stitch pattern (dotted line) ora straight stitch pattern (solid line), without a substrate. The chartshows force versus displacement.

FIG. 19 shows a bar graph comparing a ball burst strength test carriedout using 0.005 inch monofilament thread corner lock or straight stitchpatterns, either with a four layer ERT substrate or without a substrate.Peak load (N) was measured.

DETAILED DESCRIPTION

Various terms relating to aspects of the disclosure are used throughoutthe specification and claims. Such terms are to be given their ordinarymeaning in the art, unless otherwise indicated. Other specificallydefined terms are to be construed in a manner consistent with thedefinition provided herein.

As used herein, the singular forms “a,” “an,” and “the” include pluralreferents unless expressly stated otherwise.

As used herein, the terms “first” and “second” do not necessarily have atemporal relationship. For example, a “second pattern” does notnecessarily require that the “second pattern” be sewn after the “firstpattern” is sewn. These terms generally include a positionalrelationship, for example, they may designate that there are twoseparate patterns that are sewn.

A “thread interlace point” includes a region where a top thread and abottom thread are intertwined together. This may include, for example, astandard lock stitch (e.g., FIG. 1A). The top and bottom thread may beseparate threads, or may be from the same continuous thread. By way ofexample, but not of limitation, a thread interlace point may be formedwhere a sewing needle punctures a substrate material or, if thesubstrate material comprises a mesh, the thread interlace point may beformed where a sewing needle passes through a pore of the mesh.

A polygon includes shapes comprised of at least angles and vertices, andsides with at least a straight segment at the angle/vertex. The polygonmay comprise a regular or irregular shape. A “polygonal ring” comprisesa closed polygon.

A “circular ring” includes a closed circle, sphere, oval, ellipse,O-shape, and other shapes comprising rounded sides.

It has been observed in accordance with the disclosure that stitchingpatterns can be overlaid in a way that produces a locked junction ofthreads. A plurality of inter-connected corner-locked stitch patternsmay be used to produce a mesh. The corner-lock stitches resist punctureand deformation of the mesh (FIG. 12, parts A-C), such that the meshpores substantially retain their original shape when challenged by apuncture force or by tension in any direction or combination ofdirections (FIG. 6). A mesh formed from corner-locked stitches may beused as a stand-alone textile resembling a knitted or woven fabric, ormay be used as a strengthening, reinforcing, stabilizing, stiffening, orcompliance-control pattern sewn or embroidered into or onto a materialsubstrate (e.g., a biotextile, medical textile, or fabric), whichsubstrate material itself may comprise a mesh (e.g., a mesh substrate).Thus, a corner-lock stitch pattern may be used to increase or decreasethe level of compliance of, or modulate the directional compliance of asubstrate into which the pattern is sewn. A corner-lock stitch patternmay also be used to increase the strength of a substrate into which thepattern is sewn. The mesh and its underlying stitch patterns may becustomizable. Accordingly, the disclosure features corner-lock stitchpatterns, meshes comprising such stitches, substrates comprisingcorner-lock stitch patterns or corner-locked meshes, and methods forproducing such stitch patterns, meshes, and substrates.

In a first aspect, the disclosure provides methods for producingcorner-lock stitches. Corner-lock stitches comprise interlocking stitchpatterns. Corner-lock stitches are preferably created by sewing orembroidering, though in some aspects may be created by weaving,knitting, or warp knitting, and other suitable techniques. Sewing may beby machine or by hand, or by a combination thereof. Sewing may be with aballpoint needle.

It is highly preferred that the stitching patterns are formed using atleast two threads, with one such thread constituting an upper thread andthe other thread constituting a lower thread. In some aspects, thestitching patterns may be formed using a single thread, which may beconfigured in a way to constitute both the upper and lower threads sewninto a pattern. The stitching pattern may be sewn into anyconfiguration, including a regular or irregular, or variableconfiguration, including combinations or hybrids thereof. It ispreferred that corner-lock stitches are produced from continuous sewing,though the corner-lock stitches may be produced from discontinuoussewing. For example, continuous sewing may comprise sewing the firstpattern and sewing subsequent patterns without cutting the thread(s).Discontinuous sewing may comprise sewing the first pattern and sewing asubsequent pattern, but cutting the thread(s) at some point beforesewing a subsequent pattern, or otherwise between subsequent patterns.In all cases, a yarn or filament may be used in place of thread.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whichfirst pattern comprises one or more curves, one or more angles, or acombination of one or more curves and one or more angles, then sewing asecond upper thread and a second lower thread in a second pattern intothe substrate material, which second pattern comprises one or morecurves, one or more angles, or a combination of one or more curves andone or more angles. Sewing the second pattern allows at least one of theone or more curves or the one or more angles of the second pattern tooverlap at least one of the one or more curves or the one or more anglesof the first pattern. One or more such overlaps, in turn, comprise acorner-lock stitch pattern comprising at least one thread interlacepoint proximal to, in close proximity to, or substantially at the vertexof each curve, angle, or curve and angle, and two thread overlaysproximal to, in close proximity to, or substantially at each vertex, andwith each overlay comprising the second upper thread and second lowerthread enveloping the first upper thread and first lower thread. Anexample is illustrated in FIG. 3, FIG. 4A, FIG. 4B, and FIG. 4C. In someaspects, a thread overlay includes the first upper and first lowerthread being sandwiched between the second upper thread and the secondlower thread (e.g., FIG. 7). A yarn or filament may be used in place ofthread.

In some detailed aspects, the first pattern comprises a plurality ofcurves forming one or more circular rings, and the second patterncomprises a plurality of curves forming one or more circular rings(e.g., FIG. 4C). In such aspects, at least one ring of the secondpattern overlaps at least one ring of the first pattern, and eachoverlapping ring comprises a corner-lock stitch pattern comprising athread interlace point proximal to, in close proximity to, orsubstantially at the vertex of the overlapped curve of each ring and twothread overlays proximal to, in close proximity to, or substantially ateach vertex, with each overlay comprising the second upper thread andsecond lower thread enveloping the first upper thread and first lowerthread.

In some detailed aspects, the first pattern comprises a plurality ofangles forming one or more polygonal rings, and the second patterncomprises a plurality of angles forming one or more polygonal rings(e.g., FIG. 4A and FIG. 4B). In such aspects, at least one ring of thesecond pattern overlaps at least one ring of the first pattern, and eachoverlapping ring comprises a corner-lock stitch pattern comprising atleast one thread interlace point proximal to, in close proximity to, orsubstantially at the vertex of overlapped angles from each ring and twothread overlays proximal to, in close proximity to, or substantially ateach vertex, with each overlay comprising the second upper thread andsecond lower thread enveloping the first upper thread and first lowerthread. More than one interlace point may be included, for example, two,three, four, five, six, seven, eight, nine, ten, or more than teninterlace points may be included.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whichfirst pattern comprises one or more curves, one or more angles, or acombination of one or more curves and one or more angles, then sewing asecond upper thread and a second lower thread in a second pattern intothe substrate material, which second pattern comprises one or morecurves, one or more angles, or a combination of one or more curves andone or more angles. Sewing the second pattern allows at least one of theone or more curves or the one or more angles of the second pattern tooverlap at least one of the one or more curves or the one or more anglesof the first pattern. One or more overlaps comprise a corner-lock stitchpattern comprising one or more thread interlace points and two or morethread overlays, each overlay comprising the second upper thread andsecond lower thread enveloping the first upper thread and first lowerthread. See, FIG. 3, FIG. 4A, FIG. 4B, and FIG. 4C. A yarn or filamentmay be used in place of thread. More than one interlace point may beincluded, for example, two, three, four, five, six, seven, eight, nine,ten, or more than ten interlace points may be included. More than onethread overlay may be included, for example, two, three, four, five,six, seven, eight, nine, ten, or more than ten overlays may be included.

In some detailed aspects, the first pattern comprises a plurality ofangles forming one or more polygonal rings, and the second patterncomprises a plurality of angles forming one or more polygonal rings,wherein at least one ring of the second pattern overlaps at least onering of the first pattern, and at least one of the overlapping ringscomprises a corner-lock stitch pattern comprising more than one threadinterlace point (e.g., FIG. 4A and FIG. 4B). More than one threadoverlay may be included, for example, two, three, four, five, six,seven, eight, nine, ten, or more than ten overlays may be included.

In some aspects, the methods comprise sewing a first upper thread and afirst lower thread in a first pattern into a substrate material, whichfirst pattern comprises one or more straight lines, then sewing a secondupper thread and a second lower thread in a second pattern into thesubstrate material, which second pattern comprises a plurality of curvesor angles forming one or more polygonal rings. Sewing the second patternallows at least one ring of the second pattern to overlap at least oneof the straight lines of the first pattern and each overlap comprises acorner-lock stitch pattern comprising one or more thread interlacepoints and two or more thread overlays, each overlay comprising thesecond upper thread and second lower thread enveloping the first upperthread and first lower thread. A yarn or filament may be used in placeof thread. More than one interlace point may be included, for example,two, three, four, five, six, seven, eight, nine, ten, or more than teninterlace points may be included. More than one thread overlay may beincluded, for example, two, three, four, five, six, seven, eight, nine,ten, or more than ten overlays may be included. In some detailedaspects, at least one of the polygonal rings comprises a corner-lockstitch pattern comprising more than one thread interlace point. Anexample is illustrated in FIG. 5A, FIG. 5B, and FIG. 5C.

Where polygonal rings or circular rings present, the ring is preferablysewn into the substrate material. In this respect, the ring is affixedto the substrate material, for example, via standard lockstitches aboutthe ring perimeter and, thus, is distinct from a free-floating threadloop such as a loop stitch.

Corner-lock stitch patterns produced by any of the methods describedherein are also provided. Meshes comprising one or more corner-lockstitch patterns produced by any of the methods described herein are alsoprovided (a mesh may include any combination of corner-lock stitchpatterns; the mesh need not be homogeneous in terms of the type of itsunderlying corner-lock stitch pattern). Substrates comprising one ormore corner-lock stitch patterns produced by any of the methodsdescribed herein are also provided. Substrates comprising a meshcomprising one or more corner-lock stitch patterns produced by any ofthe methods described herein are also provided

A plurality of corner-lock stitches may be used in combination to createa mesh or a net. Such a mesh or net may be a stand-alone material (e.g.,not sewn or embroidered onto or into any other material). In someaspects, the mesh is sewn or embroidered onto or into a substrate. Inthis respect, the mesh may serve to impart design, strength,stiffness/rigidity, and/or reinforcement into the substrate. In someaspects, the substrate material may be removed or eliminated to leavethe mesh as a stand-alone product. For example, the substrate materialmay be dissolvable, and may be dissolved following sewing orembroidering of the mesh in order to leave the corner-locked meshbehind. The mesh and substrate material may be separated from each otherby any suitable technique in order to isolate the mesh.

In any case, the pores of the mesh, being surrounded by corner-lockedstitches substantially resist deformation via puncture (FIG. 12, partC), and substantially resist deformation via tension (FIG. 6). By way ofexample, FIG. 6 shows a representation of a corner-locked mesh, withtension being applied by pulling the mesh in the direction of thearrows. But the corner-lock stitches inhibit substantial widening of thepores in the direction of the tension (as shown in FIG. 6, the tensionbeing applied along a horizontal axis) and inhibit substantial narrowingof the pores in directions other than the direction of the tension(e.g., per FIG. 6, a vertical axis). The corner-locked meshes alsoresist deformation from vertical tension, or tension from multipledirections, including simultaneous vertical and horizontal tension. Thisstands in contrast to the deformation caused by puncture or tension asshown in FIG. 12, part B and in FIG. 2.

A mesh comprises a plurality of pores, or interstices betweenoverlapping threads or yarns, which overlapping threads or yarns maycomprise stitched threads or yarns, and which may comprise corner-lockedstitches. The corner-lock stitches may surround the pores, being at eachcorner about the pore shape. The pores may comprise any suitable shapeor dimension, or any suitable combination of shapes and/or dimensions.The pores may comprise one or more of a circular or elliptical shape, asquare, diamond, parallelogram, or rhomboid shape, a rectangular shape,a triangular shape, a pentagonal shape, a hexagonal shape, a heptagonalshape, an octagonal shape, or other polygonal shape. Non-limitingexamples of pore shapes are shown in FIG. 9 (diamond or rhomboid shape),FIG. 10 (square shape), and FIG. 11 (hexagonal shape). The pores may bearranged, for example, in rows, or in a concentric pattern, or in arandom pattern. The pores may overlap (e.g., FIG. 11). The pores may beopen, or may comprise crossing patterns that span one or more dimensionswithin the pore (See, e.g., FIGS. 8B and 8C). Such crossing patterns maycomprise overlapping zigzag stitches, including corner-locked stitches.

The pores may comprise any suitable length, width, or diameterdimensions. Such dimensions may be from about 0.1 mm to about 10 mm. Thedimensions may be from about 0.5 mm to about 5 mm, from about 0.5 mm toabout 10 mm, from about 1 mm to about 10 mm, from about 1 mm to about 8mm, from about 1 mm to about 7 mm, from about 1 mm to about 5 mm, fromabout 1 mm to about 3 mm, from about 1 mm to about 2 mm, from about 3 mmto about 9 mm, from about 3 mm to about 7 mm, from about 3 mm to about 5mm, from about 4 mm to about 10 mm, from about 4 mm to about 8 mm, fromabout 4 mm to about 6 mm, from about 5 mm to about 10 mm, from about 6mm to about 10 mm, from about 7 mm to about 10 mm, from about 8 mm toabout 10 mm, or from about 9 mm to about 10 mm.

A corner-lock stitch pattern may be sewn or embroidered into or onto asubstrate. The substrate may be any material into which filaments,yarns, or threads may be sewn into a corner-lock stitch patternaccording to this disclosure. The substrate may itself comprise a mesh,such that in some aspects, a substrate mesh may comprise a meshcomprising a corner-lock stitch pattern sewn or embroidered into thesubstrate mesh. A substrate material may be a natural or syntheticmaterial, may be a textile, and may be woven or non-woven. The substrateor the substrate material may have any thickness, or length and widthdimensions. Non-limiting examples of substrate materials include clothor fabric, lace, leather, silk, linen, nylon, polyester, polypropylene,polyethylene, cotton, satin, wool, bamboo, cashmere, jute, burlap,fleece, felt, spandex, rayon, denim, and other suitable materials, orany combination thereof. In some preferred aspects, the substratematerial is a biotextile or a medical textile. Biotextiles or medicaltextiles may be implantable in or on the human body.

Biotextiles include biocompatible materials, which may be obtained orderived from living tissue. Living tissue includes, for exampledermis/skin tissue (and sub-tissue, extracellular matrices),pericardium, peritoneum, intestine, stomach, forestomach, and othersuitable tissues. The animal source may be any suitable animal,including a human, pig, cow, or sheep, or may be synthesized, forexample, by recombinant expression. Biotextiles may be biodegradable orresorbable. Some non-limiting examples of biotextiles includeextracellular matrix-derived tissue scaffolds, autograft tissue,allograft tissue, and xenograft tissue, as well as artificial skin,artificial heart valves, and other implantable prosthetics. Medicaltextiles include biocompatible materials, which may include syntheticmaterials. Some non-limiting examples of medical textiles include herniarepair meshes or materials, which may comprise polypropylene,polyethylene, and other implantable prosthetics.

The yarn or threads used to stitch materials and create the substrate,and/or the corner-locked stitches and meshes may be made of any suitablematerial, and may comprise any suitable weight. The yarn or thread maycomprise monofilament yarn or thread, or multi-filament yarn or thread.The thread weight may be a function of the purpose to which thecorner-locked mesh is used. The thread weight may range from about 20weight to about 120 weight. The thread may comprise a denier of fromabout 1 denier to about 2000 denier. The thread may comprise a denier ofat least about 20-denier. The thread may comprise a denier of at leastabout 30-denier. The thread may comprise a denier of at least about40-denier. The thread may comprise a denier of at least about 50-denier.The thread may comprise a denier of at least about 60-denier. The threadmay comprise a denier of at least about 70-denier. The thread maycomprise a denier of at least about 80-denier. The thread may comprise adenier of at least about 90-denier. The thread may comprise a denier ofat least about 100-denier. The thread may comprise a denier of at leastabout 120-denier. The thread may comprise a denier of at least about150-denier. The thread may comprise a denier of at least about200-denier. The thread may comprise a denier of at least about250-denier. The thread may comprise a denier of at least about300-denier. The thread may comprise a denier of at least about400-denier. The thread may comprise a denier of at least about500-denier. The thread may comprise a denier of at least about600-denier. The thread may comprise a denier of at least about700-denier.

The yarn may comprise plied yarn or twisted yarn (e.g., z twist or stwist). The thread material may comprise a natural fiber, such ascotton, wool, silk, or other natural material, or may comprise asynthetic fiber such as polyester, nylon, polypropylene, rayon, or othersynthetic material. The thread may comprise a continuous filament. Thethread may comprise a monofilament. The thread may comprise a staplefilament. The thread material may comprise a metal. The thread maycomprise a wire, for example, a polymeric wire, composite wire, or metalwire. The thread material preferably is biocompatible and, in someaspects, is resorbable. The thread material may comprise apolydioxanone, polycarbonate, polyurethane, poly(alpha-ester),polyglycolide, polylactide (e.g., poly(L-lactic acid), poly(D-lacticacid), and poly(D,L-lactic acid), poly (4-hydroxybutyric acid)—which isa homopolymer of 4-hydroxybutyrate (4HB), and belongs to a diverse classof materials called polyhydroxyalkanoates (PHAs)—andpoly(lactide-co-glycolide)), polycaprolactone, polypropylene, polyester,poly(propylene fumarate), polyanhhydride, polyacetal, polycarbonate(e.g., poly(trimethylene carbonate)), poly(ortho ester),polyphosphazene, polyphosphoester, polytetrafluoroethylene, polyethyleneterephthalate, or any combination or co-polymer thereof. Polypropylene,polyester, and polyethylene are preferred, with monofilamentpolyethylene more preferred.

The yarn or thread may be colored. Colors may indicate a properorientation of the mesh or material+mesh, for example, the colors mayindicate the proper orientation for implantation of a hernia repairmesh. Colors may indicate a front or back.

Between corner-locks, the thread may further comprise other stitchpatterns, including a chain stitch, Merrow stitch, lock stitch, zigzagstitch, straight stitch, running stitch, back stitch, satin stitch, orcombinations thereof, or any other suitable stitch types. Such patternsmay serve, for example, to further strengthen the mesh, or may bedecorative.

The following Example is provided to describe corner-lock stitch patternqualities in greater detail. The Example is intended to illustrate, notto limit.

Example 1 Compliance and Strength of Corner-Lock Stitch Patterns

A corner-lock stitch pattern of polyethylene or polypropylenemonofilament threads was embroidered onto a circular substratecomprising a polytetrafluoroethylene (PTFE) external ring (included as aframe, and not to test properties of the stitches sewn into it), and apolyvinyl alcohol (PVA) internal ring (FIG. 13). In parallel, a standardstraight lock-stitch pattern (e.g., FIG. 2, no corner locks) was alsoembroidered into a PTFE/PVA substrate (FIG. 13). Following completion ofeach type of pattern, the PVA portion of substrate was dissolved awaywith water, leaving behind an embroidered corner-lock stitch patternmesh unaffixed to any substrate in the center and also affixed aroundthe perimeter to the insoluble portion of the substrate. Also inparallel, each of corner-lock and comparative straight-lock stitchpatterns were embroidered into a four-layer extracellular matrixbiotextile substrate, with the substrate not being dissolved away (FIG.14). The test samples are summarized in Table 1 (variables:polypropylene (PP) and high strength polyethylene (PE) monofilamentsused for embroidery, with corner-lock or standard straight stitchpatterns, on either a 4-layer biotextile substrate or without substrate;Both stitch patterns had a similar pore size of about 3 mm).

TABLE 1 Test sample arrays High- Strength Poly- Poly- propylene ethyleneCorner- Straight- (PP) (PE) Sub- Lock Lock Mono- Mono- strate- No TypeMesh Mesh filament filament 4 layers substrate A X X X B X X X C X X X DX X X E X X X F X X X G X X X H X X X

Each of the stitch patterns (+/−substrate) were studied for strength andcompliance (compliance is a function of, among other things, strength,stress, elongation, rebound, deformability, and elasticity properties ofthe particular materials or combination of materials) using the BallBurst test method. The Ball Burst test method is used in the art tomeasure the force required to rupture a textile, by forcing a 1 inchdiameter polished steel ball through a 1.75 inch inner-diameter textilering at a constant rate of extension, 12 inch/minute (ASTM D767-07(Reapproved 2011)). The Ball Burst tests were conducted on each stitchpattern (+/−substrate) on an Instron Model 3345 Single column TensileTester with ball burst ring clamps and fixture (FIG. 15).

Compliance control tests are charted in FIGS. 16 through 18. FIG. 16graphs Force (N) vs. Displacement (in mm) data for 2 samples (Type E andG, Table 1), highlighting the compliance difference between thedifferent grid patterns for embroidered tissue. Direction Arrow I showshow, for a given displacement, the corner-lock grid pattern offers lessresistance than the standard straight grid pattern. Direction Arrow IIshows how, for a given resistance load, the corner-lock stitch patternsallows more ball travel distance than the straight stitch pattern. Thisillustrates how the corner-lock grid pattern is more compliant than astraight grid pattern, with each pattern made of the same material (highstrength PE in FIG. 16) and with similar pore dimensions. FIGS. 17 (PP)and 18 (high strength PE) illustrate this same relationship where thecorner-lock stitch pattern and straight stitch pattern were without asubstrate samples (Table 1, Type A-D). The data show that thecorner-lock stitch pattern is more compliant than the straight-stitchpattern, whether or not a substrate underlies the pattern, andregardless of the stitch pattern thread material. Of note, it wasobserved that manipulation of the shape and type of the corner-lockstitch patterns allows for modulation (greater or lesser) of thecompliance (not shown).

Strength tests are summarized in FIG. 19. FIG. 19 shows, for the samesize monofilament, the difference between PP and PE materials usingaveraged Ball Burst peak loads. N-values are either 4 or 6 samples pertype. In every paired configuration, the average peak load for the PEwas observed to be higher than the average peak load for PP. In thechart, corner-lock versus standard straight stitch patterns, formed ofPP or PE, on either a 4-layer biotextile substrate or without asubstrate (stitched into PVA that was dissolved away to leave behind thestitch pattern mesh) are compared for their strength. As shown, highstrength polyethylene monofilament threads (0.005″ monofilament)exhibited higher strength characteristics than polypropylenemonofilament threads (0.005″ monofilament) in both straight andcorner-lock stitch patterns. In general, corner-lock stitch patternswere found to exhibit higher strength characteristics than standardstraight stitch patterns.

The disclosure is not limited to the embodiments described andexemplified above, but is capable of variation and modification withinthe scope of the appended claims.

We claim:
 1. A corner-lock stitch pattern, comprising a first pattern ofa first upper thread or yarn and a first lower thread or yarn comprisingone or more curves, one or more angles, or a combination of one or morecurves and one or more angles, and a second pattern of a second upperthread or yarn and a second lower thread or yarn comprising one or morecurves, one or more angles, or a combination of one or more curves andone or more angles; wherein at least one of the one or more curves orthe one or more angles of the second pattern overlaps at least one ofthe one or more curves or the one or more angles of the first pattern,and one or more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points and two or more threadoverlays in which the second upper thread and second lower threadenvelope the first upper thread and first lower thread.
 2. Thecorner-lock stitch pattern according to claim 1, wherein the firstpattern and the second pattern each comprise one or more angles, and oneor more of the overlaps comprises a corner-lock stitch patterncomprising one or more thread interlace points proximal to the vertex ofeach angle.
 3. The corner-lock stitch pattern according to claim 2,wherein the two or more thread overlays are proximal to the vertex. 4.The corner lock stitch pattern according to claim 2, wherein the firstpattern comprises a plurality of angles forming one or more polygonalrings, and the second pattern comprises a plurality of angles formingone or more polygonal rings, wherein at least one ring of the secondpattern overlaps at least one ring of the first pattern, and eachoverlapping ring comprises a corner-lock stitch pattern comprising oneor more thread interlace points proximal to the vertex of overlappedangles from each ring and two or more thread overlays proximal to eachvertex in which the second upper thread and second lower thread envelopethe first upper thread and first lower thread.
 5. The corner-lock stitchpattern according to claim 2, wherein the first pattern and the secondpattern each comprise one or more angles, and one or more of theoverlaps comprises a corner-lock stitch pattern comprising one or morethread interlace points substantially at the vertex of each angle. 6.The corner-lock stitch pattern according to claim 5, wherein the two ormore thread overlays are proximal to the vertex.
 7. The corner lockstitch pattern according to claim 5, wherein the first pattern comprisesa plurality of angles forming one or more polygonal rings, and thesecond pattern comprises a plurality of angles forming one or morepolygonal rings, wherein at least one ring of the second patternoverlaps at least one ring of the first pattern, and each overlappingring comprises a corner-lock stitch pattern comprising one or morethread interlace points substantially at the vertex of overlapped anglesfrom each ring and two or more thread overlays proximal to each vertexin which the second upper thread and second lower thread envelope thefirst upper thread and first lower thread.
 8. The corner lock stitchpattern according to claim 7, wherein the one or more polygonal ringscomprise substantially a diamond, square, rhomboid, rectangular, orparallelogram shape.
 9. The corner lock stitch pattern according toclaim 7, wherein the one or more polygonal rings comprise an irregularshape.
 10. The corner-lock stitch pattern according to claim 1, whereinthe first pattern and the second pattern each comprise one or morecurves, and one or more of the overlaps comprises a corner-lock stitchpattern comprising one or more thread interlace points proximal to thevertex of each curve.
 11. The corner-lock stitch pattern according toclaim 10, wherein the two or more thread overlays are proximal to thevertex.
 12. The corner lock stitch pattern according to claim 10,wherein the first pattern comprises a plurality of curves forming one ormore circular rings, and the second pattern comprises a plurality ofcurves forming one or more circular rings, wherein at least one ring ofthe second pattern overlaps at least one ring of the first pattern, andeach overlapping ring comprises a corner-lock stitch pattern comprisinga thread interlace point proximal to the vertex of the overlapped curveof each ring and two thread overlays proximal to each vertex in whichthe second upper thread and second lower thread envelope the first upperthread and first lower thread.
 13. The corner lock stitch patternaccording to claim 1, wherein the first upper thread, the first lowerthread, the second upper thread, and the second lower thread comprises abiocompatible material.
 14. The corner lock stitch pattern according toclaim 13, wherein the biocompatible material is resorbable.
 15. Thecorner lock stitch pattern according to claim 1, wherein the first upperthread, the first lower thread, the second upper thread, and the secondlower thread comprises a monofilament thread.
 16. The corner lock stitchpattern according to claim 15, wherein the monofilament thread comprisesa monofilament polyethylene thread.
 17. A hernia repair material,comprising a substrate comprising the corner-lock stitch patternaccording to claim
 1. 18. The hernia repair material according to claim17, wherein the substrate comprises a polymer mesh.
 19. The herniarepair material according to claim 18, wherein the polymer meshcomprises a polymer selected from the group consisting of polydioxanone,polycarbonate, polyurethane, poly(alpha-ester), polyglycolide,poly(L-lactic acid), poly(D-lactic acid), poly(D,L-lactic acid), poly(4-hydroxybutyric acid), polycaprolactone, polyethylene, polypropylene,polyester, poly(propylene fumarate), polyanhydride, polyacetal,polycarbonate, poly(ortho ester), polyphosphazene, polyphosphoester,polytetrafluoroethylene, polyethylene terephthalate.
 20. The herniarepair material according to claim 17, wherein the substrate comprises abiotextile comprising an extracellular matrix.